Automatic Spin Coater

Introduction:

It mainly used for liquid, colloid’s thin films formation on the surface of materials, suitable for silicon wafer, wafer, and glass, ceramic and other plate-making surface coating process, It can be applied in scientific research, education and production.

High precision multiprogram controller, it can set up a rotating coating process to store seven different samples, 25 different speed states can be set for each coating process.

Parameter

300 – 10000 revolutions per minute, speed stability: + - 0.1 %, the highest speed is 10000 revolutions per minute, size: 260mm width x 350mm depth x 260mm height

Optional accessories

1: Special vacuum chuck

2: Oil-free vacuum pump